The research wafer surface cleanser and does in the eclipse cutting regulation to the wet etching the GaAs surface etching condition and the relative electro tropism influence.
碩士 === 國立臺北科技大學 === 化學工程研究所 === 98 === This experiment mainly makes use of dissimilarity kind the chemicals(like NH4 OHses, HCL, and HF...etc.) is the detergent of dry wet etching pre-baking, mainly is develop a photo-resist behind know that the oxide does to effectively clean to avoid an etching in...
| Main Authors: | , |
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| Other Authors: | |
| Format: | Others |
| Language: | zh-TW |
| Published: |
2010
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| Online Access: | http://ndltd.ncl.edu.tw/handle/rc3q2v |