Post Aluminum Metal Etch Residue Removal
碩士 === 萬能科技大學 === 材料科技研究所 === 98 === In semiconductor industry, when dry etch step of Al process has been finished, there will always be polymer residue left on side wall or surface of the metal lines. To guaranty cleanness and stability of subsequent processes, the polymer residue must be removed....
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| Format: | Others |
| Language: | zh-TW |
| Published: |
2011
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| Online Access: | http://ndltd.ncl.edu.tw/handle/43949151733738468483 |