Construction of a Prediction Model of Wafer Temperature and Film Thickness in a Multiwafer LPCVD Furnace
碩士 === 長庚大學 === 化工與材料工程學系 === 99 === The behavior and characteristics of the low pressure chemical vapor deposition (LPCVD) furnace used in semiconductor manufacturing industries are studied in this work. It is well known the wafer temperatures have significant effects on film thickness. As the wafe...
| Main Authors: | , |
|---|---|
| Other Authors: | |
| Format: | Others |
| Published: |
2011
|
| Online Access: | http://ndltd.ncl.edu.tw/handle/13517370404536089563 |