Application of X-Ray Photoelectron Spectroscopy on Analysis of Ultra-Shallow Junctions
碩士 === 長庚大學 === 光電工程研究所 === 99 === In this study, we used X-ray photoelectron spectroscopy (XPS) to analyze ultra-shallow junctions (USJs). The USJ samples were activated by laser annealing. Than deactivation annealing was performed. The XPS signal for phosphorus increased after deactivation anneali...
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| Format: | Others |
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2011
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| Online Access: | http://ndltd.ncl.edu.tw/handle/43014227365770483663 |