A Study of Microcrystalline Silicon Thin Film Deposited By ECR-CVD
碩士 === 建國科技大學 === 電機工程系暨研究所 === 99 === Microcrystalline silicon (uc-Si) thin films have been prepared by electron cyclotron resonance chemical vapor deposition (ECR CVD) system. The uc-Si deposited by ECR with different concentration SiH4 (SiH4/SiH4+ H2), deposition pressures, microwave powers, and...
| Main Authors: | , |
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| Other Authors: | |
| Format: | Others |
| Language: | zh-TW |
| Published: |
2011
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| Online Access: | http://ndltd.ncl.edu.tw/handle/82898577295834411665 |