The study of Opto-Electronic Charactrtistics for Transparent Semiconductor Thin Film Grown by RTCVD
碩士 === 大葉大學 === 電機工程學系 === 99 === We investigated the ZnO thin film which were deposited on corning glass substrates at different chamber temperature by Rapid-Thermal chemical vapor Deposition (RTCVD). The chamber pressure was set at 1.5Torr. The crystal structure and surface morphologies of ZnO th...
| Main Authors: | , |
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| Other Authors: | |
| Format: | Others |
| Language: | zh-TW |
| Published: |
2011
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| Online Access: | http://ndltd.ncl.edu.tw/handle/63721232522240539805 |