The Performance Comparisons among the Shewhart, EWMA and CUSUM Control Charts for Monitoring the Semiconductor Process: A case study of Photolithography Critical Dimension.
碩士 === 輔仁大學 === 應用統計學研究所 === 99 === With the technology and process progressing, the Critical Dimension of DRAM is getting smaller and smaller. According to this reason, the precision of detect ability is requested higher and higher relatively. To the Semi-conductor industry, the Statistic Process C...
| Main Authors: | , |
|---|---|
| Other Authors: | |
| Format: | Others |
| Language: | zh-TW |
| Published: |
2011
|
| Online Access: | http://ndltd.ncl.edu.tw/handle/11399485233552749593 |