A study on optimization process for wafer cleaning through supercritical carbon dioxide fluid method
碩士 === 輔英科技大學 === 環境工程與科學系碩士班 === 99 === Abstract In recent years, with the development of semiconductor integrated circuit industry from mm to nm process, the traditional cleaning methods became inadequate in cleaning the wafer. A wafer manufacturing process using traditional wet cleaning technolog...
| Main Authors: | , |
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| Other Authors: | |
| Format: | Others |
| Language: | zh-TW |
| Published: |
2011
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| Online Access: | http://ndltd.ncl.edu.tw/handle/66582846389884487193 |