The Influence of Si-Cr Target and Sputtering Condition on Electric Resistance of the Si-Cr Thin Film
碩士 === 義守大學 === 材料科學與工程學系碩士班 === 99 === This experiment investigates proportions of different components of Si-Cr target effects. By DC Sputtering to change sputtering power（500、750、1000W）and working pressure（3、5、8mtorr）to prepare thin film. By different elements、film thickness, sputtering power, wo...
| Main Authors: | , |
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| Other Authors: | |
| Format: | Others |
| Language: | zh-TW |
| Published: |
2011
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| Online Access: | http://ndltd.ncl.edu.tw/handle/20661610795448276668 |