Fabricating Silicon Nanowires Using Multiple-Etching Technique
碩士 === 義守大學 === 電子工程學系碩士班 === 99 === In this study, nanoimprint lithography was used to define patents for isotropic and anisotropic multiple etching with Reactive Ion-Beam Etching (RIE) technique to fabricating single channel and multiple channels suspended single crystal silicon nanowires on silic...
| Main Authors: | , |
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| Other Authors: | |
| Format: | Others |
| Language: | zh-TW |
| Published: |
2011
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| Online Access: | http://ndltd.ncl.edu.tw/handle/49790633685208656819 |