Study on the Fabrication and Characteristics of c-Si Solar Cell with Heterojunction Structure
碩士 === 國立中興大學 === 光電工程研究所 === 99 === In this study, we use very high frequency plasma enhanced chemical vapor deposition (VHF-PECVD) to deposite intrinsic hydrogenated amorphous silicon thin films (i-a-Si:H) and p-type hydrogenated amorphous silicon thin films (p-a-Si:H). VHF-PECVD can produce a hig...
| Main Authors: | , |
|---|---|
| Other Authors: | |
| Format: | Others |
| Language: | zh-TW |
| Published: |
2011
|
| Online Access: | http://ndltd.ncl.edu.tw/handle/58204961380077016467 |