Fabrication of hydrogenated amorphous silicon thin-film solar cells with modulation gas ratio
碩士 === 國立中興大學 === 光電工程研究所 === 99 === In this study, 13.56 MHz plasma-enhanced chemical vapor deposition (PECVD) with pulse-wave modulation of RF plasma is used to fabricate hydrogenated amorphous silicon (a-Si:H) single i-layer by changing total gas flow, and a-Si:H/hydrogenated protocrystalline s...
| Main Authors: | , |
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| Other Authors: | |
| Format: | Others |
| Language: | zh-TW |
| Published: |
2011
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| Online Access: | http://ndltd.ncl.edu.tw/handle/04137626262862716244 |