Study of the mechanical lithography by Atomic Force Microscopy

碩士 === 國立中興大學 === 材料科學與工程學系所 === 99 === In the development of nanotechnology and semiconductor process, the improvement of lithography techniques is crucially important and indispensable. When the optical lithography encountered the difficulty of the resolution which reached physical limitations, ma...

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Bibliographic Details
Main Authors: Yung-Chieh Yang, 楊詠傑
Other Authors: Hsun-Feng Hsu
Format: Others
Language:zh-TW
Published: 2011
Online Access:http://ndltd.ncl.edu.tw/handle/68677852966523440759