Fabrication of Silicon Thin Films Using Hot-Wire CVD for Solar Cell Applications
博士 === 國立中興大學 === 材料科學與工程學系所 === 99 === Hot-wire chemical vapor deposition (HWCVD) is a promising technique for depositing device-quality thin amorphous, polycrystalline, and epitaxial silicon films at lower temperatures and higher deposition rates. With this technique, deposition species are genera...
| Main Authors: | , |
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| Other Authors: | |
| Format: | Others |
| Language: | en_US |
| Published: |
2011
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| Online Access: | http://ndltd.ncl.edu.tw/handle/hq22f9 |