Effects of process parameters on the properties of fluorinated amorphous carbon films prepared by plasma enhanced chemical vapor deposition
碩士 === 國立中興大學 === 材料科學與工程學系所 === 99 === The properties of fluorinated amorphous carbon (a-C:F) films prepared by plasma enhanced chemical vapor deposition (PECVD) method are investigated. Hexafluorethane (C2F6), acetylene (C2H2), and argon (Ar) were used as the precursor gases. The mass flow rate of...
| Main Authors: | , |
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| Other Authors: | |
| Format: | Others |
| Language: | zh-TW |
| Published: |
2011
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| Online Access: | http://ndltd.ncl.edu.tw/handle/90252475393777667086 |