The influence of p/i interface on hydrogenated amorphous silicon solar cells
碩士 === 國立中興大學 === 電機工程學系所 === 99 === In this thesis, 13.56 MHz plasma-enhanced chemical vapor deposition (PECVD) with pulse-wave modulation of RF plasma is used to fabricate the hydrogenated amorphous silicon (a-Si:H) solar cells. The initial gas concentration is adjusted to control the dissocia...
| Main Authors: | , |
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| Other Authors: | |
| Format: | Others |
| Language: | zh-TW |
| Published: |
2011
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| Online Access: | http://ndltd.ncl.edu.tw/handle/13566522814091809944 |