Effects of Stress on Hafnium Oxide Thin Films
碩士 === 國立成功大學 === 電機工程學系碩博士班 === 99 === In this thesis, the stress effect of HfO2 insulating layer within the MOS structure has been discussed. The stress effects on HfO2 as functions of film thicknesses, anneal methods (furnace anneal or rapid thermal process), anneal atmosphere (oxygen gas or nitr...
| Main Authors: | , |
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| Format: | Others |
| Language: | zh-TW |
| Published: |
2011
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| Online Access: | http://ndltd.ncl.edu.tw/handle/48663120101227863893 |