Fabrication of sealed nonuniform SU-8 microchannels by a novel double-side partial-exposure method

碩士 === 國立交通大學 === 工學院碩士在職專班精密與自動化工程組 === 99 === Here a novel process is proposed to fabricate sealed micro channels by using negative photoresist SU-8. In previous studies, fabricating sealed micro channels needs either wafer bonding or multiple photoresist coating. The proposed method needs only SU...

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Bibliographic Details
Main Authors: Wen, Hung-Ming, 溫鋐明
Other Authors: Hsu, Wensyang
Format: Others
Language:zh-TW
Published: 2010
Online Access:http://ndltd.ncl.edu.tw/handle/45266833370233923552