The Random Dopants and Random Traps Induced Threshold Voltage Variations in Strained CMOS Devices
碩士 === 國立交通大學 === 電子研究所 === 99 === For the CMOS device technology with gate length 90 nm and beyond, strained technique has been a successful technology to extend the Moore’s law with further device scaling. Recent studies have revealed that the most mature CMOS technology is by the use of different...
Main Authors: | Cheng, Cheng-Ying, 程政穎 |
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Other Authors: | Chung, Steve-S. |
Format: | Others |
Language: | en_US |
Published: |
2010
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Online Access: | http://ndltd.ncl.edu.tw/handle/71042067945894561022 |
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