NBTI/PBTI Degradation and Noise Margin Measurement Circuit of Nano-scale CMOS SRAM

碩士 === 國立交通大學 === 電子研究所 === 99 === Lifetime reliability is one of the key design factors for robust VLSI systems. Bias Temperature Instability, Hot Carrier Injection, and Time Dependent Dielectric Breakdown have become major concerns for performance and yield of nano-scale CMOS VLSI systems. Static...

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Bibliographic Details
Main Authors: Tsai, Ming-Chien, 蔡銘謙
Other Authors: Jou, Shyh-Jye
Format: Others
Language:en_US
Published: 2010
Online Access:http://ndltd.ncl.edu.tw/handle/51290356974988520234