Surface treatments of GaN substrates by chemical mechanical polish and thermal anneal
碩士 === 國立交通大學 === 電子物理系所 === 99 === In this work, the major purpose was to study the surface treatments of GaN substrates by chamical mechanical polish(CMP) and thermal anneal and expect to obtain epi-ready GaN substrate. Both photoluminescence and cathodoluminescence indicate that CMP and thermal a...
| Main Author: | |
|---|---|
| Other Authors: | |
| Format: | Others |
| Language: | zh-TW |
| Published: |
2011
|
| Online Access: | http://ndltd.ncl.edu.tw/handle/20088875461531511142 |