Study of Mask-free Wet Etching on Sapphire Substrate and Its Application on Light Emitting Diodes
博士 === 國立中央大學 === 化學工程與材料工程研究所 === 99 === Chemical wet-etching on c-plane sapphire wafers by three etching solutions (H3PO4, H2SO4 and H3PO4/H2SO4 mixing solution) were studied. Among these etching agents, the mixing H3PO4/H2SO4 solution has the fastest etching rate (1.5 µm/min.). Interestingly, w...
| Main Authors: | , |
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| Other Authors: | |
| Format: | Others |
| Language: | en_US |
| Published: |
2011
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| Online Access: | http://ndltd.ncl.edu.tw/handle/94127214620968631645 |