Fabricate AlN Thin Film for Surface Acoustic Wave Device Using Pulsed DC Reactive Sputtering
碩士 === 國立高雄第一科技大學 === 光電工程研究所 === 99 === This thesis focuses on the growth c-axis preferred orientation (002) oriented of aluminum nitride (AlN) thin film by using Pulsed DC reactive magnetron sputtering. We use the Al metal target (99.999 % purity) and high-purity Ar and N2 as the reaction gas at t...
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| Format: | Others |
| Language: | zh-TW |
| Published: |
2011
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| Online Access: | http://ndltd.ncl.edu.tw/handle/20837153609192499795 |