RF-Sputtering of ZnO thin films on Si(111) substrates : the effects of Al2O3 buffer layers and the pin diode formation
碩士 === 國立中山大學 === 物理學系研究所 === 99 === RF magnetron sputtering has been employed to deposit n-type epitaxial zinc oxide thin films on p-type silicon substrates to form p-n diode structures. Commonly found on silicon, native SiOx layers, typically of a few nanometer thick, would hinder the epitaxial gr...
| Main Authors: | , |
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| Format: | Others |
| Language: | zh-TW |
| Published: |
2011
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| Online Access: | http://ndltd.ncl.edu.tw/handle/55985075837166149449 |