A Nano Lithography Process based upon Fresnel Zone Plate
碩士 === 國立臺灣大學 === 機械工程學研究所 === 99 === The line width of integrated circuits is getting much and much smaller due to the fast progress which has been made in IC technology. Extreme ultraviolet lithography (EUVL) is considered one of the next generation lithography technologies which have the most po...
| Main Authors: | , |
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| Format: | Others |
| Language: | zh-TW |
| Published: |
2011
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| Online Access: | http://ndltd.ncl.edu.tw/handle/01070539687755991890 |