Preparation and Characterizations of Microcrystallite SiGe Films on Glass Substrates by Sputter Deposition
碩士 === 國立臺灣科技大學 === 工程技術研究所 === 99 === Hydrogenated microcrystalline silicon germanium (μc-Si1-xGex:H) thin films were deposited on CORNING #1737 glass substrates with in-situ substrate heating at 150oC by radio frequency magnetron co-sputtering of Si and Ge, x≦0.2. H2/Ar ratios and annealing temper...
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| Format: | Others |
| Language: | en_US |
| Published: |
2011
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| Online Access: | http://ndltd.ncl.edu.tw/handle/90729183049458531905 |