A Study of The Characteristics of ZnO Thin Films Using Chemical Vapor Deposition Method
碩士 === 國立虎尾科技大學 === 機械與機電工程研究所 === 99 === In this study, ZnO thin films were grown on silicon substrate by chemical vapor deposition method. A three-zone tube furnace was used to produce of ZnO thin film at high temperature fixed deposition time, and gas flow rate under different temperature (500 ℃、...
| Main Authors: | , |
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| Other Authors: | |
| Format: | Others |
| Language: | zh-TW |
| Published: |
2011
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| Online Access: | http://ndltd.ncl.edu.tw/handle/39mm6c |