Design of Multiple RESURF LDMOS with P-top rings and STI regions in 65nm CMOS Technology

碩士 === 亞洲大學 === 資訊工程學系碩士班 === 99 === In this work, a novel multiple RESURF P-top rings LDMOS with shallow trench isolation (STI) stucture based on the 65 nm baseline low-voltage CMOS technology by three-dimentsional Sentaurus process and device simulations. A optimized uniform electric filed distrib...

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Bibliographic Details
Main Authors: Yuan-Ming Li, 李元銘
Other Authors: Gene Sheu
Format: Others
Language:zh-TW
Published: 2011
Online Access:http://ndltd.ncl.edu.tw/handle/41798275984609977509