Using CMOS-MEMS Process Production of Blood Pressure Sensor and Intracranial Pressure monitoring
碩士 === 國立臺北科技大學 === 機電整合研究所 === 99 === The fabrication of a Blood Pressure Sensor and Intracranial Pressure monitoring using the TSMC 0.35 um complementary metal oxide semiconductor process and a post-process have been investigated. The metal layers of the CMOS process are used as the sensing electr...
| Main Authors: | , |
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| Other Authors: | |
| Format: | Others |
| Language: | zh-TW |
| Published: |
2011
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| Online Access: | http://ndltd.ncl.edu.tw/handle/45bbcg |