Analysis and Research of Photoresist Stacking Process

碩士 === 中華大學 === 機械工程學系碩士在職專班 === 100 === This thesis is a study on TSV photolithography and etch process by using available resources to achieve the same functions of SU-8 photoresi- st,It helps to determine the correlation of polyimide photoresist thickn- ess versus etch depth during the etch proce...

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Bibliographic Details
Main Authors: Chia-He Cheng, 鄭家和
Other Authors: Jium-Ming Lin
Format: Others
Language:zh-TW
Published: 2012
Online Access:http://ndltd.ncl.edu.tw/handle/99942708671779880223