Characterization And Properties Of Transparent Conducting TiO2: Mo Thin Films Deposited By RF-sputtering Method
碩士 === 義守大學 === 材料科學與工程學系 === 100 === Mo-doped TiO2 transparent conductive films were deposited on glass substrates(Corning;1737) and LaAlO3 substrates by RF magnetron sputtering. The electrical conductivity of pure TiO2 is low , in order to increase electrical conductivity of TiO2 thin films, Mo+6...
| Main Authors: | , |
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| Other Authors: | |
| Format: | Others |
| Language: | zh-TW |
| Published: |
2012
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| Online Access: | http://ndltd.ncl.edu.tw/handle/19611398574475179908 |