Design, Fabrication and Measurement of Interference-Type Infrared Absorbing Layers

碩士 === 國立高雄應用科技大學 === 光電與通訊研究所 === 100 === The purpose of the study is to design and fabricate CMOS-Compatible interference-type infrared absorbing layers. The structure is composed of a metallic reflection layer and a metallic absorbing layer with a dielectric spacer. The infrared absorptance of th...

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Bibliographic Details
Main Authors: Tai-Yu Chen, 陳泰宇
Other Authors: Chung-Nan Chen
Format: Others
Language:zh-TW
Online Access:http://ndltd.ncl.edu.tw/handle/55664675486428474314