The Studies Of Nd And Zr-Doped BiFeO3 Films For Metal/Ferroelectric/Insulator/Semiconductor Capacitors In Non-Volatile Memory Applications
碩士 === 明志科技大學 === 材料工程研究所 === 100 === Metal-ferroelectric (Nd and Zr-doped BiFeO3)-insulator (HfO2)- semiconductor (MFIS) structures have been fabricated by co-sputtering technique. The crystalline phase of ferroelectric film was identified by x-ray diffraction (XRD) pattern. The surface morphology...
| Main Authors: | , |
|---|---|
| Other Authors: | |
| Format: | Others |
| Language: | zh-TW |
| Published: |
2012
|
| Online Access: | http://ndltd.ncl.edu.tw/handle/03946621287335939879 |