Low-vacuum formation and characterization of Al thin films prepared by magnetron sputtering
碩士 === 國立中興大學 === 材料科學與工程學系所 === 100 === The research employed low-vacuum (1.3×10-2 Pa, pumping time about 3 minutes) magnetron sputtering to prepare Al thin films with similar quality compatible to those prepared at high-vacuum (6.6×10-4 Pa, pumping time about 30 minutes). The low-vacuum process ca...
| Main Authors: | , |
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| Other Authors: | |
| Format: | Others |
| Language: | zh-TW |
| Published: |
2012
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| Online Access: | http://ndltd.ncl.edu.tw/handle/64463165721861988388 |