Fabrication of Asymmetrical Microlens-Array by Off-axis Exposure Method
碩士 === 國立中興大學 === 精密工程學系所 === 100 === The manufacturing method uses two lithography process to produce an off-step structure in photoresist. Then the photoresist structure can be produced to the asymmetric microlens array by thermal reflow. In the experiments, two sets of photomask, including 500 an...
| Main Authors: | , |
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| Other Authors: | |
| Format: | Others |
| Language: | zh-TW |
| Published: |
2012
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| Online Access: | http://ndltd.ncl.edu.tw/handle/41038798164979465969 |