Fabrication of Optoelectronic Device using Nano-Crack Lithography
碩士 === 國立成功大學 === 光電科學與工程學系 === 100 === In this dissertation, nanoscale optoelectronic devices are fabricated using Nano-Crack Lithography (NCL). It is well known that thermal cracking of a bowtie photoresist pattern will form along the neck direction. The cracking line is very narrow and extends...
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| Format: | Others |
| Language: | zh-TW |
| Published: |
2012
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| Online Access: | http://ndltd.ncl.edu.tw/handle/43971709461408851110 |