Metal Embedded Photo-mask for Sub-Micrometer Scaled Photolithography and Fabrication of Patterned Sapphire Substrate
碩士 === 國立成功大學 === 奈米科技暨微系統工程研究所 === 100 === This thesis develops a new type of metal-embedded photo-masks which can be used in standard photolithography and for fabricating patterned sapphire substrates. There are two kinds of metal-embedded photo-masks being investigated. First, a quartz-based meta...
| Main Authors: | , |
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| Other Authors: | |
| Format: | Others |
| Language: | zh-TW |
| Published: |
2012
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| Online Access: | http://ndltd.ncl.edu.tw/handle/87173561388936250957 |