Study of Nanoindentation and Nanoscratch Behavior for Annealing Strained-SiGe Thin Films
博士 === 國立交通大學 === 機械工程學系 === 100 === Silicon-germanium (SiGe) material has recently become the most attractive semiconductor thin film in HBT (Heterojunction Bipolar Transistor) and CMOS(Completed Metal Oxide Semiconductor) because of its outstanding behavior. Nevertheless, due to the lattice mismat...
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| Format: | Others |
| Language: | en_US |
| Published: |
2012
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| Online Access: | http://ndltd.ncl.edu.tw/handle/65698531623940688085 |