Study of Amorphous and Microcrystalline Silicon Oxide as Absorber and Doped Layers for Thin-film Solar Cell Applications
碩士 === 國立交通大學 === 光電工程學系 === 100 === In this study, plasma-enhanced chemical vapor deposition (PECVD) was used to deposit hydrogenated amorphous (a-SiOx:H) and microcrystalline (μc-SiOx:H) silicon oxide for thin-film solar cell applications. In order to effectively enhance the broaden spectral respo...
| Main Authors: | , |
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| Format: | Others |
| Language: | en_US |
| Published: |
2011
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| Online Access: | http://ndltd.ncl.edu.tw/handle/93305949398124657133 |