Study on the Property of Zirconium Oxide Thin Film Based Capacitors by Sol-Gel Method
碩士 === 國立交通大學 === 理學院應用科技學程 === 100 === Traditionally, the semiconductor factory prepared thin films by physical vapor deposition (PVD) or chemical vapor deposition (CVD). But those methods have involved several problems, such as the uniformity of the thin films and the preparation cost. The next te...
| Main Authors: | , |
|---|---|
| Other Authors: | |
| Format: | Others |
| Language: | zh-TW |
| Published: |
2012
|
| Online Access: | http://ndltd.ncl.edu.tw/handle/59122418844471270406 |