CMP Micro Scratch Root Cause and its Improvement
碩士 === 國立交通大學 === 工學院半導體材料與製程設備學程 === 100 === Base on the improvement of IC manufacturing , more and more transistors and memory cells will be integrated in one chip to gain better profit , however , the micro scratch of CMP will cause short between metal plugs and then suffer product yield. And...
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| Format: | Others |
| Language: | zh-TW |
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2011
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| Online Access: | http://ndltd.ncl.edu.tw/handle/01993915155149864965 |