Improve the Precision of Film Deposition by Shadow Mask
碩士 === 國立交通大學 === 工學院半導體材料與製程設備學程 === 100 === In this thesis, shadow mask with post structure was fabricated by utilizing the inductively coupled plasma (ICP) etching technique (one of the high density plasma etching techniques). The mask was used for metal deposition on release device layer in an o...
| Main Authors: | , |
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| Other Authors: | |
| Format: | Others |
| Language: | zh-TW |
| Published: |
2011
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| Online Access: | http://ndltd.ncl.edu.tw/handle/73253710524771747120 |