Overlay Error Control of Lithography Process
碩士 === 國立交通大學 === 平面顯示技術碩士學位學程 === 100 === In semiconductor manufacturing process, the overlay error is an important issue in photolithography process control. This overlay error is generated by Box-in-Box structure variation in measurement process. For wafer manufacture, pre-layer of the chips is l...
| Main Authors: | , |
|---|---|
| Other Authors: | |
| Format: | Others |
| Language: | zh-TW |
| Published: |
2011
|
| Online Access: | http://ndltd.ncl.edu.tw/handle/32957879172160993341 |