Using electron cyclotron resonance chemical vapor deposition at low temperature growth of doped crystalline silicon thin film for amorphous silicon thin film solar cells
碩士 === 國立中央大學 === 光電科學研究所 === 100 === This paper is based on electron cyclotron resonance chemical vapor deposition (ECR-CVD) to research the characteristics of p and n-doped silicon thin film and apply on thin film solar cell. ECR-CVD is a high density plasma system that plasma generated in the ECR...
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| Format: | Others |
| Language: | zh-TW |
| Published: |
2012
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| Online Access: | http://ndltd.ncl.edu.tw/handle/21166947200626853673 |