An Effective Two Stage Dispatching Rule for Cycle Time Reduction in Photolithography Area with Multi-Workstation
碩士 === 國立清華大學 === 工業工程與工程管理學系 === 100 === In the semiconductor industry, mean cycle time is usually one of the key perfor-mance measures used by fabrication facilities to maintain their competitive advantage. As the machine in the photolithography area is more expensive than that in other areas, pho...
| Main Authors: | , |
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| Format: | Others |
| Language: | zh-TW |
| Published: |
2012
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| Online Access: | http://ndltd.ncl.edu.tw/handle/17881712280429658672 |