UNISON Framework for Dispatching Problem of Photolithography Area in Semiconductor Manufacturing

• Main Authors: Hsin, Wan-Min, 辛宛珉
• Other Authors: Chien, Chen-Fu
• Format: Others
• Language: zh-TW
• Published: 2012
• Online Access: http://ndltd.ncl.edu.tw/handle/67627006991620429576

碩士 === 國立清華大學 === 工業工程與工程管理學系 === 100 === Photolithography machines are the bottleneck of a wafer fab, its dispatching has a significant effect on loading balance of other area. Effectively and efficiently utilize the bottleneck is important to improve tool productivity and maintain the competitive advantage of operation efficiency, production management in the photolithography has become an important issue of semiconductor manufacturing. In addition, customer satisfaction has become an important issue in the semiconductor industry due to the increasing competition. High hit rate become one of the important competitive factors, scheduling and dispatching strategy are critical for increasing competitive advantage. Thus, this study aims to construct a decision framework for dispatching decision model in photolithography area. The proposed framework based on multi objective genetic algoruthm approach to plan, analysis and slove dispatching problem in photolithography area which derive the best strategy to enhance the capacity utitlize, reduce labor cost and sutusfy the customers need. Empirical study has been done to sort the strategy to fufill the operation target and improve predormance for overall competeiveness. The results have proved the validity of the proposed framework.