An Electrical and Reliability Study of High-k Gate Dielectric/ Metal Gate Device for nano-scale CMOS technologies
博士 === 國立清華大學 === 電子工程研究所 === 100 === 因申請專利緣故，資料延後公開
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| Format: | Others |
| Language: | en_US |
| Published: |
2012
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| Online Access: | http://ndltd.ncl.edu.tw/handle/77210016539167467785 |