Growth of ZrO2 by Heat Treating ZrN Thin Film under Controlled Atmosphere

碩士 === 國立清華大學 === 工程與系統科學系 === 100 === The purpose of this study is to solve the wettability issue by growing ZrO2 from heat treatment of the ZrN thin films on stainless steel substrate and investigate the oxidation mechanism of ZrN films in different atmospheres. ZrN thin films were deposited on Si...

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Main Author: 謝志威
Other Authors: 黃嘉宏
Format: Others
Language:en_US
Published: 2012
Online Access:http://ndltd.ncl.edu.tw/handle/71502771900010383035
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spelling ndltd-TW-100NTHU55930502015-10-13T21:22:42Z http://ndltd.ncl.edu.tw/handle/71502771900010383035 Growth of ZrO2 by Heat Treating ZrN Thin Film under Controlled Atmosphere 在控制氣氛及真空中藉由熱處理氮化鋯薄膜成長氧化鋯 謝志威 碩士 國立清華大學 工程與系統科學系 100 The purpose of this study is to solve the wettability issue by growing ZrO2 from heat treatment of the ZrN thin films on stainless steel substrate and investigate the oxidation mechanism of ZrN films in different atmospheres. ZrN thin films were deposited on Si and 304 stainless steel substrates using hollow cathode discharge ion-plating (HCD-IP), and were annealing at temperatures ranging from 700 to 1000°C and over durations ranging from 1 to 4 hours. Vacuum (510-6 Torr) and forming gas (N2/H2=9) environment were selected to prevent sever oxidation. As the annealing temperature was higher than 800°C, the specimens were totally oxidized in the forming gas within one hour. However, ZrN still remained as the major phase in the films even annealing at 1000°C for 4hr in vacuum. The microstructure and composition also revealed different behaviors in two annealing atmosphere. The difference may be derived from the surface structure in different annealing environments. The surface oxide was non-protective in the forming gas so that the oxygen in the system can easily reacted with ZrN, and the volume expansion during oxidation would lead to the formation of blisters and cracks on the sample surface. Once cracks appeared on the surface, oxygen could penetrate through the oxide layer and react with ZrN and accelerate the oxidation rate; on the other hand, since the surface oxide was protective in vacuum, the diffusion of oxygen was hindered and remained an intact surface. Retained ZrN could be observed on the surface layer in stainless steel-based specimens even annealed at 800°C for 4hr after vacuum annealing. The ratios of corrosion area for all the oxidized ZrN films were less than 0.2% after 500hr salt spray test indicating an excellent corrosion resistance. Thus, by selecting a proper environment, ZrO2 can be grown from ZrN without peeling and crack formation, which may provide good corrosion protection. Moreover, the stress could be relieved without significant change in properties as the specimens were annealed at 1000°C for 1hr in vacuum. 黃嘉宏 喻冀平 2012 學位論文 ; thesis 109 en_US
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description 碩士 === 國立清華大學 === 工程與系統科學系 === 100 === The purpose of this study is to solve the wettability issue by growing ZrO2 from heat treatment of the ZrN thin films on stainless steel substrate and investigate the oxidation mechanism of ZrN films in different atmospheres. ZrN thin films were deposited on Si and 304 stainless steel substrates using hollow cathode discharge ion-plating (HCD-IP), and were annealing at temperatures ranging from 700 to 1000°C and over durations ranging from 1 to 4 hours. Vacuum (510-6 Torr) and forming gas (N2/H2=9) environment were selected to prevent sever oxidation. As the annealing temperature was higher than 800°C, the specimens were totally oxidized in the forming gas within one hour. However, ZrN still remained as the major phase in the films even annealing at 1000°C for 4hr in vacuum. The microstructure and composition also revealed different behaviors in two annealing atmosphere. The difference may be derived from the surface structure in different annealing environments. The surface oxide was non-protective in the forming gas so that the oxygen in the system can easily reacted with ZrN, and the volume expansion during oxidation would lead to the formation of blisters and cracks on the sample surface. Once cracks appeared on the surface, oxygen could penetrate through the oxide layer and react with ZrN and accelerate the oxidation rate; on the other hand, since the surface oxide was protective in vacuum, the diffusion of oxygen was hindered and remained an intact surface. Retained ZrN could be observed on the surface layer in stainless steel-based specimens even annealed at 800°C for 4hr after vacuum annealing. The ratios of corrosion area for all the oxidized ZrN films were less than 0.2% after 500hr salt spray test indicating an excellent corrosion resistance. Thus, by selecting a proper environment, ZrO2 can be grown from ZrN without peeling and crack formation, which may provide good corrosion protection. Moreover, the stress could be relieved without significant change in properties as the specimens were annealed at 1000°C for 1hr in vacuum.
author2 黃嘉宏
author_facet 黃嘉宏
謝志威
author 謝志威
spellingShingle 謝志威
Growth of ZrO2 by Heat Treating ZrN Thin Film under Controlled Atmosphere
author_sort 謝志威
title Growth of ZrO2 by Heat Treating ZrN Thin Film under Controlled Atmosphere
title_short Growth of ZrO2 by Heat Treating ZrN Thin Film under Controlled Atmosphere
title_full Growth of ZrO2 by Heat Treating ZrN Thin Film under Controlled Atmosphere
title_fullStr Growth of ZrO2 by Heat Treating ZrN Thin Film under Controlled Atmosphere
title_full_unstemmed Growth of ZrO2 by Heat Treating ZrN Thin Film under Controlled Atmosphere
title_sort growth of zro2 by heat treating zrn thin film under controlled atmosphere
publishDate 2012
url http://ndltd.ncl.edu.tw/handle/71502771900010383035
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