Optical properties of ZnO/MgO multilayer films grown by sputtering

• Main Authors: Zih-Kuan Wen, 溫子寬
• Other Authors: Kwong-Kau Tiong
• Format: Others
• Language: zh-TW
• Published: 2011
• Online Access: http://ndltd.ncl.edu.tw/handle/07642941917573674743

碩士 === 國立臺灣海洋大學 === 電機工程學系 === 100 === We have deposited the ZnO/MgO multilayer films designed for Bragg reflector by sputtering technique. The 10 and 15 pairs of ZnO/MgO multilayer films with designed thickness of each single ZnO and MgO layer are deposited on silicon substrate. X-ray diffraction (XRD) and scanning electron microscope (SEM) and reflectivity spectrum have been deployed to study, respectively, the structural and optical properties of the ZnO/MgO multilayer films. The XRD spectra of the ZnO/MgO multilayer films clearly exhibit the typical diffraction peaks of ZnO and MgO and the SEM images show the cross section of ZnO/MgO multilayer films. The normal and angle-dependent reflectance spectra were measured to analyze the optical properties of the ZnO/MgO multilayer films. The theoretical simulation calculated from transfer matrix was compared with the experimental results. The analyses showed that the thickness of ZnO or MgO layer and the interface between ZnO and MgO layer has an adverse effect on the reflectivity spectrum of the ZnO/MgO multilayer films. Bragg on the study we have proper the use refined single layer thickness and the appropriate number of ZnO/MgO layer pairs to improve the optical properties of Bragg reflectors for applications in optoelectronic devices.