Oxidational Characteristics and Mechanical Properties of Nitrogen-doped Fluorinated Diamond-Like Carbon Coated Si Substrate by RF-Plasma Enhanced Chemical Vapor Deposition
碩士 === 國立臺灣海洋大學 === 機械與機電工程學系 === 100 === Nitrogen doped fluoride diamond-like carbon (FN-DLC) films were deposited on p-type(100) silicon substrates by radio frequency plasma enhanced chemical vapor deposition(rf PECVD) technique using mixture of methane(CH4),tetrafluoromethane(CF4),and nitrogen(N2...
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Other Authors: | |
Format: | Others |
Language: | zh-TW |
Published: |
2012
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Online Access: | http://ndltd.ncl.edu.tw/handle/38383354137194354726 |