Oxidational Characteristics and Mechanical Properties of Nitrogen-doped Fluorinated Diamond-Like Carbon Coated Si Substrate by RF-Plasma Enhanced Chemical Vapor Deposition

碩士 === 國立臺灣海洋大學 === 機械與機電工程學系 === 100 === Nitrogen doped fluoride diamond-like carbon (FN-DLC) films were deposited on p-type(100) silicon substrates by radio frequency plasma enhanced chemical vapor deposition(rf PECVD) technique using mixture of methane(CH4),tetrafluoromethane(CF4),and nitrogen(N2...

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Bibliographic Details
Main Authors: Chiuan-Yi, Liu, 劉權毅
Other Authors: Chou, Chau-Chang
Format: Others
Language:zh-TW
Published: 2012
Online Access:http://ndltd.ncl.edu.tw/handle/38383354137194354726